A proven track record of innovation and invention...
Method and apparatus for depositing antireflective coating
United States 7,070,657 Issued July 4, 2006 Method and apparatus for improving accuracy in photolithographic processing of substrates Taiwan 355819 Issued April 11, 1999 Method and apparatus for applying films using reduced deposition rates Taiwan 401461 Issued August 11, 2000 A silicon carbide deposition for use as a low dielectric constant anti-reflective coating Taiwan 523803 Issued March 11, 2003 Method and apparatus for depositing antireflective coating Europe EP0778496 Issued June 12, 2002 Method and system for depositing films Europe EP0877098 Issued August 20, 2003 |
Method and apparatus for depositing antireflective coating United States 5,968,324 Issued June 28, 1996 Method for applying films using reduced deposition rates United States 6,083,852 Issued July 4, 2000 Method and apparatus for applying films using reduced deposition rates United States 6,324,439 Issued November 27, 2001 Method and apparatus for improving accuracy in photolithographic processing of substrates United States 6,562,544 Issued May 13, 2003 Silicon carbide deposition for use as a low-dielectric constant anti-reflective coating United States 6,635,583 Issued October 21, 2003 Method for forming silicon containing layers on a substrate United States 6,656,840 Issued December 2, 2003 Method of nitrogen doping of fluorinated silicate glass (FSG) while removing the photoresist layer United States 6,797,646 Issued September 28, 2004 Silicon carbide deposition for use as a low dielectric constant anti-reflective coating United States 6,951,826 Issued October 4, 2005 |